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The Synthesis, Irradiation, and Analysis of Materials (SIAM) platform relies on its ability to use and combine different spectroscopies (XPS, ToF-SIMS, and IBA) to characterize materials. These techniques enable a comprehensive evaluation of almost all types of samples, such as metals, welds, glass, polymers, powders, liquids, in vivo biological materials, etc.SIAM has several facilities for the functionalization of materials and/or the synthesis of thin films by plasma treatments.Our experience, acquired through several projects funded by the European Commission and regional authorities, qualifies us to analyze complex samples such as nanoparticles in complex matrices (food, culture media, cells from in vitro experiments, and organs from in vivo experiments).

Characterization and functionalization solutions The SIAM platform can provide characterization and/or analysis solutions in fields such as photovoltaics, smart coatings, nanomaterials, public health, and biomedical applications, to name but a few. Our client portfolio covers several industrial sectors, SMEs, and universities. Our clients benefit from a comprehensive technical approach (one-stop shop) thanks to our research logisticians, who provide support from the initial request to the delivery of results. Learn more about the SIAM platform Expertise See content Equipment See content Case studies See content Team See content Contact | Technology platforms Synthesis, Irradiation, and Analysis of Materials (SIAM) siam@unamur.be

Several state-of-the-art instruments enable the synthesis, irradiation, functionalization, and analysis of samples:X-ray photoelectron spectroscopy (XPS)Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS)Ion beam analysis (IBA)Ion beam functionalization (IBMM)Plasma treatment (PECVD, DC, RF, and AC)

SIAM offers you some examples of services according to the technique used.

Director | Julien Colaux Julien Colaux holds a PhD in physics. His expertise covers nuclear physics (ion beam analysis (IBA), ion implantation) and the development of thin films using PVD and PECVD.Contact: julien.colaux@unamur.be  Spokesperson | Pierre Louette Pierre Louette holds a PhD in physics and is a certified secondary school teacher. His expertise covers electron spectroscopy techniques (XPS, HREELS, EELS, etc.) and physics education.Contact: pierre.louette@unamur.be  IBA Expert | Paul-Louis Debarsy Contact: paul-louis.debarsy@unamur.be  Surface analysis expert | Alexandre Felten Contact: alexandre.felten@unamur.be   ALTAÏS Engineer | Tijani Tabarrant Contact: tijani.tabarrant@unamur.be  Senior Technician | Frédéric ComeAdministrative Assistant | Olivia Genot Contact | Technology platforms Synthesis, Irradiation, and Analysis of Materials (SIAM) siam@unamur.be

Contact | Technology platforms Synthesis, Irradiation, and Analysis of Materials (SIAM) siam@unamur.be

IBA uses MeV ion beams to probe the composition and obtain elemental depth profiles in the near-surface layer of solids.This technique enables: The analysis of the biodistribution and biopersistence (in vivo) of nanomaterials, their characterization and quantification;The characterization of thin-film materials and airborne particles;The study of phase transformation.For decades, the IBA has played a leading role in nuclear astrophysics, materials science, life sciences, heritage sciences, and archaeology.

Ion Beam Modification of Materials (IBMM) allows the electronic, optical, mechanical, or magnetic properties of various materials to be modified in a controlled manner. This is known as functionalizing materials.This process allows precise control of the composition and structure of materials at the atomic level, paving the way for applications in electronics, biomaterials, and specialized coatings.

Plasma sputteringA process in which energetic particles from a gas plasma bombard a solid target material, dislodging (sputtering) its atoms. These ejected atoms then deposit onto a substrate, forming an ultra-thin layer. This is a type of physical vapor deposition (PVD) used to create coatings and thin films for various applications, including semiconductor manufacturing, optical devices, and wear-resistant surfaces.4 chambers for plasma sputtering (DC, RF, and AC)Plasma functionalization Thin film deposition PECVD deposition PECVD (plasma-enhanced chemical vapor deposition) is a thin film deposition technique that uses plasma energy to activate gaseous precursors, causing them to react and form a solid film on a substrate. The main advantage of PECVD is that it operates at lower temperatures than conventional CVD, allowing high-quality films to be deposited on temperature-sensitive materials and creating various insulating, protective, and electronic layers in the fields of microelectronics, optics, and packaging.4 chamber for PECVD deposition and functionalization Powder processing Other related equipment and technologies Image IBA - Ion Beam Analysis See content Image IBMM - Ion Beam Modification See content Image ToF-SIMS - Time-of-flight secondary ion mass spectroscopy See content Image XPS - X-ray Photoelectron Spectroscopy See content

The ToF-SIMS (time-of-flight secondary ion mass spectroscopy) technique can be used to determine the elemental and molecular composition of a sample's surface. It is also very useful for creating 2D maps (from µm2 to cm2) and depth profiles (using a sputtering gun).The advantages are:High mass resolutionHigh lateral and depth resolution (200 nm and 1 nm)High sensitivity (ppm)Parallel detection of all ionsElemental, isotopic, and molecular identification3 analysis modes: spectrometry, imaging, depth profiling

The XPS technique can be used to detect elements present on the surface of samples, determine their atomic concentration and chemical state (e.g., C-C, C-O, C-F or oxidation states). It is also possible to perform depth profiling to determine the atomic concentration of multilayers.

Pierre AssenmakerSandrine BiémarLouis CarréJérémy DodeigneCatherine GuirkingerWafa HammediErika Lombart (ADRE)Laurence MeurantLouis Escouflaire (research logistician)